UV-B辐射增强下水稻苗期硅营养性状的QTL定位及其与环境互作效应分析

QTL mapping and analysis of QTL-environment interaction associated with two silicon nutrient traits in rice seedlings exposed to enhanced UV-B radiation

  • 摘要: 以“Lemont”和“Dular”杂交建立的包含123个家系的水稻重组自交系(RILs)群体为材料, 选用水稻根系硅吸收能力和叶片硅利用率为指标, 进行水稻硅营养遗传性状QTL定位, 并分析其与UV-B辐射增强的互作效应。结果表明, 控制水稻叶片硅利用率的4个加性QTL分别在第2、3、10染色体上, 而控制根系硅吸收能力的1个加性QTL位于第11染色体上。QTL与UV-B辐射互作分析发现2对控制根系硅吸收能力和3对控制叶片硅利用率的基因×环境上位性QTL, 其中只有1对控制根系硅吸收能力的QTL效应值较大。说明水稻这两种硅营养性状中, 根系硅吸收能力较叶片硅利用率受UV-B辐射影响大, 在抗UV-B辐射育种中以叶片硅利用率为水稻硅营养遗传选择的指标具有较高效率。

     

    Abstract: Mapping of quantitative trait loci (QTL) and its interaction with the environment (UV-B radiation) were analyzed via two silicon nutrient traits, root uptake to silicon (RUS) and leaf use efficiency of silicon (LUES) in rice RILs population seedlings under enhanced UV-B radiation. The results show that four QTLs controlling LUES are located on chromosomes 2, 3 and 10. Only one QTL that controls RUS is located on chromosome 11. Besides, two and three pairs of genotype-environment (GE) epistasis QTL are detected for RUS and LSUE respectively. Only one of these that controls RUS displays a significant effective value. This indicates that RUS is more severely influenced by UV-B radiation than LUES. Hence it could be more efficient to use LUES as a genetic trait in breeding UV-B resistant rice.

     

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