控制水稻耐光氧化特性的QTL定位

QTL mapping of rice leaf photooxidation tolerance control

  • 摘要: 利用“Lemont”和“Dular”水稻杂交后代单粒传衍生的123个F12家系所组成的重组自交系(Recombinant inbred lines, RILs)群体及其含97个SSR标记的连锁图谱, 以耐性指数(T)和敏感性指数(S)为测定指标, 应用WinQTLcart 2.5定位软件, 采用复合区间作图法对2个性状进行定位分析。结果表明, 在RIL群体中, 2个性状呈连续分布, 受微效多基因控制, 并且各性状均存在一定数量的超亲遗传类型。2个性状共检测到11个QTL, 各QTL的LOD值为2.02~5.07, 贡献率为6%~23%。其中在第1、2、3、6、8染色体上检测到控制耐性指标的7个QTLs, 贡献率为6%~19%; 在第1、3、5、8染色体上检测到控制敏感性指标的4个QTLs, 贡献率分别为19%、23%、6%和7%; 分别在第3、8染色体的相同区间内(RM85~RM468和RM408~RM250)检测到2个性状的QTLs, 这很好地解释了2性状之间存在着极显著负相关性即存在一因多效现象(Pleiotrophic effect)。

     

    Abstract: A linkage map consisting of 97 SSR markers was constructed using 123 F12 lines (recombinant inbred lines, RILs) derived from crossing between “Lemont” and “Dular” rice cultivars. QTL analysis was conducted for flag leaf photooxidation tolerance, including tolerance index (T) and sensitivity index (S). Using WinQTLcart 2.5 software, a total of eleven QTLs are detected with percentage variance explanation (PVE) of 6%~23%, and LOD of QTLs of 2.02~5.07. Of the QTLs, seven tolerance indices are detected on chromosomes 1, 2, 3, 6 and 8, with PVE of 6%~19%; four controlling sensitivity indices are detected on chromosomes 1, 3, 5 and 8, respectively explaining 19%, 23%, 6% and 7% of total phenotypic variation. On the basis of both traits, two QTLs for tolerance index and sensitivity index are co-localized around RM85~RM468 and RM408~RM250 respectively, which could explain negative significant correlation between tolerance index and sensitivity index, i.e . the pleiotrophic effect.

     

/

返回文章
返回